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Etude de la gravure profonde du silicium dans un réacteur haute densité micro-onde de type propagatif = Deep silicon etching in a high density surfatron reactorFrancou, Mireille; Sadeghi, N.1995, 230 p.Thesis

A comparative study of three microwave-induced plasma sources for atomic emission spectrometry. II: Evaluation of their atomization/excitation capabilities for chlorinated hydrocarbonsCAMUNA-AGUILAR, J. F; PEREIRO-GARCIA, R; SANCHEZ-URIA, J. E et al.Spectrochimica acta. Part B : Atomic spectroscopy. 1994, Vol 49, Num 6, pp 545-554, issn 0584-8547Article

The use of optical emission spectrometry with microwave induced plasma (MIP) discharges in a surfatron combined to different types of hydride generation for the determination of arsenicLUGE, S; BROEKAERT, J. A. C.Mikrochimica acta (1966. Print). 1994, Vol 113, Num 3-6, pp 277-286, issn 0026-3672Article

Comparative study of argon and helium plasmas in a TM₀₁₀ cavity and a surfatron and their use for hydride generation microwave-induced plasma atomic emission spectrometryBULSKA, E; BROEKAERT, J. A. C; TSCHÖPEL, P et al.Analytica chimica acta. 1993, Vol 276, Num 2, pp 377-384, issn 0003-2670Article

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The electromagnetic performance of a surfatron-based coaxial microwave plasma torchMOISAN, M; GRENIER, R; ZAKRZEWSKI, Z et al.Spectrochimica acta. Part B : Atomic spectroscopy. 1995, Vol 50, Num 8, pp 781-789, issn 0584-8547Article

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Atomic spectroscopy with surface wave plasmasHUBERT, J; BORDELEAU, S; TRAN, K. C et al.Fresenius' journal of analytical chemistry. 1996, Vol 355, Num 5-6, pp 494-500, issn 0937-0633Conference Paper

Optical emission spectra from microwave oxygen plasma produced by surfatron dischargeMUSIL, J; MATOUS, J; RAJSKY, A et al.Czechoslovak journal of physics. 1993, Vol 43, Num 5, pp 533-540, issn 0011-4626Article